Sl. No.
|
Name of the student
|
Title of Thesis
|
Year of Award
|
Name of the
Co-guide(s), if any
|
1.
|
Sathe Sandeep Jayant
|
Study of the effects of
Reactive Ion Etching on Silicon and Gallium Arsenide
|
1994
|
Nil
|
2.
|
L.Neelima
|
Extraction of doping profiles
from MOS capacitance-voltage measurements
|
1995
|
Nil
|
3.
|
Deepa Nair J.S.
|
Development of Silicon Wafer
Bonding for Microaccelerometer
|
1996
|
Dr.A.DasGupta
|
4.
|
Rejina Rani Yarramala
|
Design and Fabrication of
n-channel MOSFET for SOI CMOS
|
1999
|
Nil
|
5.
|
K. Sasi
Sekar
|
Improvement of the existing
RTP system using thermal modelling and design of
advanced RTP equipment
|
2000
|
Dr. A.DasGupta
|
6.
|
P.V.Sudheer
|
A Study of TiO2
and TiO2/SiO2 films as alternate gate dielectrics for
Si MOS devices
|
2000
|
Nil
|
7.
|
Bandaru Aravinda Kumar
|
Fabrication of Airbridge Structures on Silicon and InP
Substrates
|
2001
|
Nil
|
8.
|
Ranbir Singh
|
Fabrication of MIS capacitors
with alternative high-k gate dielectric (SiO2/Si3N4)
and their characterization
|
2001
|
Dr. M.S. Ramachandra Rao
|
9.
|
Abhijit Das
|
A Study of Tantalum Oxide as
an alternate high-k gate dielectric for Si MOS devices
|
2001
|
Dr. M.S. Ramachandra Rao
|
10.
|
Ezilarsan Ponnaiah K.P
|
A Study of Tantalum Pentoxide as an alternative high-k gate dielectric for Si
MOS devices
|
2002
|
Dr. M.S. Ramachandra Rao
|
11.
|
Tadikonda Ramakrishna
|
Quartz Micromachining for
Sensor Applications
|
2002
|
Dr. M.S. Ramachandra Rao
|
12.
|
Keshab Chandra Sethi
|
A Study of Titanium Dioxide:
An alternate high-k gate dielectric for Si MOS devices
|
2002
|
Dr. M.S. Ramachandra Rao
|
13.
|
Anand Kumar Illa
|
Analytical Subthreshold Current Modeling and The Equivalent Box
Profile of Non-Uniformly doped Silicon-On-Insulator (SOI) MOSFETs
|
2003
|
Nil
|
14.
|
J.N.Suresh Babu
|
Studies on MOS Capacitors
using Ta2O5/SiO2 Stacked Dielectric
|
2003
|
Nil
|
15.
|
Rajesh Gupta
|
Studies on MOS capacitors
using Ta2O5 as Gate Dielectric
|
2004
|
Nil
|
16.
|
Ajay Gahlot
|
Studies on MOS capacitors
using Al2O3 as Gate Dielectric
|
2004
|
Nil
|
17.
|
N.T.Rama rao
|
A Study of Stacked Al2O3/
Ta2O5: An Alternate High-k Gate Dielectric for Si MOS
devices
|
2004
|
Nil
|
18.
|
Naresh Chandani
|
Reliability Study of Thin
gate Oxides
|
2004
|
Nil
|
19.
|
Manas Ranjan Sahoo
|
Design of a RF MEMS
Capacitive Shunt Switch
|
2004
|
Nil
|
20.
|
V.Krishna Kishore Mannem
|
Design and Fabrication of
MEMS Test Structures for Material Property Extraction
|
2005
|
Nil
|
21.
|
Hitesh Kumar
|
Study of FIBL in Bulk and SOI
MOSFETs with High-k Gate Dielectrics
|
2005
|
Nil
|
22.
|
N.SivaCharan
|
Design of MESFET based Transimpedance Preamplifier for Optical Detector
|
2005
|
Nil
|
23.
|
Rakesh Kumar
|
Design of a test structure
for a MEMS switch
|
2005
|
Nil
|
24.
|
Rohit Soni
|
Characterization of Intrinsic
Stress in Dielectric Micromechanical Bragg Mirrors for Tunable VCSEL
|
2005
|
Prof. P.Meissner
|
25.
|
Biswadeep Das Roy
|
Fringing induced Barrier
Lowering in Bulk and SOI MOSFETs
|
2006
|
Nil
|
26.
|
Shilpa Aglawe
|
Realization of Thin Gate
Oxide using Chemical & Electrochemical Etching
|
2006
|
Nil
|
27.
|
V. Pushpalatha
|
Analytical Drain Current
Model of Ballistic MOSFET
|
2007
|
Nil
|
28.
|
Pushparaj Singh
|
Study of High-k Dielectric
Material (Co-doped HfO2) For MOS Devices
|
2007
|
Nil
|
29.
|
Suryadeep Das
|
Characterization and
Fabrication of Metal/SiO2/Si3N4/SiO2/Si (SONOS-type) Non-Volatile
Semiconductor Memory Device
|
2008
|
Nil
|
30.
|
Raja.P
|
Study of High-K Dielectric
Materials for MOS Gate Application on Different Substrates
|
2008
|
Nil
|
31.
|
Amartya Awasthi
|
Design and Fabrication of
Sliver Solar Cells
|
2010
|
Nil
|