Since its inception in January 2007, the group has been actively engaged in novel design, fabrication and characterizations of integrated optoelectronic devices for communication systems and sensor applications. The group is now equipped with micro/nano fabrication facilities (Centre for NEMS and Nanophotonics) and device characterization facilities (Integrated Optoelectronics Lab) – with a major research focus in the area of silicon photonics and optical interconnect technologies.